Publications

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Journal Article
Cai L. Effects of rapid thermal anneal on refractive index and hydrogen content of plasma-enhanced chemical vapor deposited silicon nitride films Rohatgi A, Yang D, EL-Sayed MA. J. Appl. Phys.Journal of Applied Physics [Internet]. 1996 ;80(9):5384. Available from: http://dx.doi.org/10.1063/1.363480