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Ebong A, Doshi P, Narasimha S, Rohatgi A, Wang J, EL-Sayed MA. The effect of low and high temperature anneals on the hydrogen content and passivation of Si surface coated with SiO2 and SiN films. Journal of the Electrochemical Society. 1999 ;146:1921-1924.
Cai L. Effects of rapid thermal anneal on refractive index and hydrogen content of plasma-enhanced chemical vapor deposited silicon nitride films Rohatgi A, Yang D, EL-Sayed MA. J. Appl. Phys.Journal of Applied Physics [Internet]. 1996 ;80(9):5384. Available from: http://dx.doi.org/10.1063/1.363480