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The effect of low and high temperature anneals on the hydrogen content and passivation of Si surface coated with SiO2 and SiN films. Journal of the Electrochemical Society. 1999 ;146:1921-1924.
. Effects of rapid thermal anneal on refractive index and hydrogen content of plasma-enhanced chemical vapor deposited silicon nitride films . J. Appl. Phys.Journal of Applied Physics [Internet]. 1996 ;80(9):5384. Available from: http://dx.doi.org/10.1063/1.363480
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